robeko in-house exhibition & workshop
PLASMATECHNOLOGY
29.09.2015 – 01.10.2015
AGENDA
ALL LECTURES 30. September 2015
robeko An der Heide 3B D-67678 Mehlingen
Phone +49 6303 8065638 Fax +49 6303 8065639
E-mail
[email protected] Web www.robeko.de
LECTURE SCHEDULE 30. September 2015
Agenda / Schedule in the morning / Day 2 / 30.09.15 TIME
INFO
09:00
COMPANY
TOPIC
PRESENTER
robeko
Welcome
Rolf Schäfer
09:10
Lecture 1
SCI
Operating Characteristics and Advantages of the RAM-Bar®
John Schmeling
09:35
Lecture 2
Gencoa
Reactive gas control of hybrid PVD/CVD processes for self healing barrier layer technology
Dermot Monaghan
10:00
Lecture 3
KIT
A new high performance MW plasma source
Sven Ulrich
10:25
BREAK
10:45
Lecture 4
GfE Fremat
Sprayed rotatable targets – different qualities for one material but various applications
Grit Hüttl
11:10
Lecture 5
Plansee
New materials and design aspects for refractory rotatable targets
Christoph Adelhelm
11:35
Lecture 6
RFI
Unravelling the mysteries of an RF automatch
John Punnett
12:00
LUNCH BREAK
13:30
Lecture 7
Busch
Screw pumps for harsh processes in the Coating and Semiconductor Industry
Karsten Fenske
13:55
Lecture 8
Pfeiffer Vacuum
Performance Range and Limits of Turbomolecular pumps
Alexander Gerhard
14:20
Lecture 9
Fraunhofer IST
Recent developments in processes and materials of Optical Coatings
Michael Vergöhl
14:45
BREAK
15:00
Lecture 10
Sentech
Combined Ellipsometry and Reflectometry/Transmission for Insitu Multilayer Control
Uwe Richter
15:25
Lecture 11
M-U-T
Using spectrally resolved R/T characteristics for inline process monitoring
Nancy Hecker-Denschlag
15:50
Lecture 12
robeko
Process development and evaluation – Capabilities and recent results
Tobias Radny
robeko
Closing remarks
Rolf Schäfer
16:15
SPUTTERING COMPONENTS
TM
2/8
LECTURE 1 + 2 30. September 2015
09:10 Lecture 1
Operating Characteristics and Advantages of the RAM-Bar® / John Schmeling
SPUTTERING
Operating Characteristics and Advantages of the RAM-Bar®
COMPONENTS
John Schmeling Sputtering Components, Inc.; 275 Alexander Drive, Owatonna 55060, USA
TM
Abstract The RAM-Bar has already shown the ability to produce highly uniform coating on large area substrates by adjusting the local positions on the magnet bar. To further highlight the capabilities of this versatile tool the plasma impedance and the amount of heat transferred to the substrate are explored as a function of adjusting the height of the entire magnet bar.
09:35 Lecture 2
Reactive gas control of hybrid PVD/CVD processes for self healing barrier layer technology / Dermot Monaghan Creating self-healing moisture barriers by vacuum plasma D. P. Monaghan1, V. Bellido-Gonzalez1, B. Daniel1, J. Brindley1, H. Li1, I. Fernandez2, A. Wennberg2 1 Gencoa Ltd, Physics Road, Liverpool, L249HP, UK 2 Nano4energy, C/o Escuela Técnica Superior de Ingenieros Industriales (ETSII-UPM), Instituto de Fusión Nuclear, C/José Gutiérrez Abascal 2, Madrid 28006, Spain
Abstract There is a strong need to protect current and future thin film devices from the effects of moisture attack from the environment in which they operate. Typically, such barriers are also required to be transparent as part of their functionality. This paper will illustrate a method to create single and multilayer barrier structures that can offer a high degree of protection of the underlying devices. These structures are created by a mixture of vacuum plasma processes – both physical vapour deposition (PVD) and chemical vapour deposition (CVD). The effectiveness of the structures has been assessed by an acid vapour etching of a sacrificial layer to mimic the underlying device. A mode of hybrid PVD/PECVD deposition has been developed that can create a single layer coating structure with enhanced levels of protection normally only associated with multi-layer structures. The key to the effectiveness of a single layer is ability to ‘heal’ itself during deposition so that through layer defects are not present in the structure. This ability has been termed a ‘self-healing’ moisture barrier due to the unusual ability to prevent defects during deposition.
3/8
LECTURE 3 + 4 30. September 2015
10:00 Lecture 3
A new high performance MW plasma source / Sven Ulrich A new high performance micro wave plasma source S. Ulrich, J. Ye, M. Stüber Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM-AWP), Hermannvon-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany
Abstract We illustrate a novel microwave plasma source designed for large-area industrial plasma surface processing and film deposition. The source uses 2.45 GHz microwave energy emitted from a dipole antenna centered at the focal point of a parabolic reflector to generate a quasiparallel microwave beam, thus effectively producing large-volume, homogeneous, high density plasmas at low pressures even far from the source. Its wide applications involve high-rate PECVD deposition of a-C:H coatings up to several tens of µm/h, hybrid PECVD-PVD deposition (together with magnetron sputtering, arc evaporation, etc.) of advanced carbon-based nanocomposite or multilayer coatings, high-rate plasma etching, and large-area ion sources (such as nitrogen). The plasma source will be shown for its easy integration into commercial PVD/ CVD coating units, and its expandability in accordance with requirements of processing area and homogeneity. We therefore demonstrate the integration of two such plasma sources in a Hauzer PVD machine of type HTC 625 from Hauzer Techno Coating BV. The high performance of the sources will be illustrated under various different plasma parameters through their capability for large-area, high-rate, homogeneous growth of a-C:H coatings with acetylene/ argon mixtures. We also analyze the profile of the plasma density, ion energy within the HTC625 processing chamber at various operation conditions (microwave power, type of working gas, pressure, etc.) by means of electrical double-probe, retarding field analyzer, as well as optical emission spectroscopy (OES).
10:45 Lecture 4
Sprayed rotatable targets – different qualities for one material but various applications / Grit Hüttl Sprayed rotatable targets – different qualities for one material but various applications Grit Hüttl, Thomas Bergmann, Thomas Schröder, Folke Steinert GfE Fremat GmbH, Lessingstraße 41, 09599 Freiberg, Germany
Abstract Rotatable targets are widely used in different industrial applications. Thermal Spray is a technology which is well suited to manufacture those targets. There are different types of spray technologies which can be used for target manufacturing. In combination with the raw material quality and process parameters it is possible to manufacture different target qualities. Materials like Si, Cr and Ag will be used as samples to describe what properties the target manufacturing can influence.
4/8
LECTURE 5 + 6 30. September 2015
11:10 Lecture 5
New materials and design aspects for refractory rotatable targets / Christoph Adelhelm New materials and design aspects for refractory rotatable targets Christoph Adelhelm Plansee SE, Metallwerk-Plansee-Straße 7, 6600 Reutte, Austria
Abstract Thin films from refractory metals like molybdenum and tungsten are used in the manufacturing of displays, touch panels and thin film solar cells for many years. Rotary sputtering targets are getting more and more important mainly due to improved utilization. In this talk the manufacturing route for refractory targets by powder metallurgy is introduced and different design possibilities are discussed to further increase the material utilization. New target materials with superior properties are introduced: corrosion resistant MoTa and MoNb for touch panels and WNi for smart glass. Results from sputtering tests for different material qualities and the influence on the sputtering process are presented.
11:35 Lecture 6
Unravelling the mysteries of an RF automatch / John Punnett UNRAVELLING THE MYSTERIES OF AN RF AUTOMATCH John Punnett RF Industries Ltd; Nork Works, Nork Gardens, Banstead, Surrey; SM7 1NZ; UK
Abstract Many plasma processes require the precise control & application of RF Power to a vacuum chamber. In a typical plasma system a RF Generator provides the power source and an Automatic Matching Network provides a means of coupling that power from the standardised 50-ohm Output Impedance of the RF Generator to the complex impedance of the vacuum chamber. The RF Automatching Network is often the ‘least understood’ part of the RF delivery system and the purpose of this short presentation is to give an overview as to how an RF Automatch works and some of the important design considerations.
5/8
LECTURE 7 + 8 30. September 2015
13:30 Lecture 7
Screw pumps for harsh processes in the Coating and Semiconductor Industry / Karsten Fenske Screw pumps for harsh processes in the Coating and Semiconductor Industry Karsten Fenske Dr.-Ing. K. Busch GmbH, Schauinslandstraße 1, 79689 Maulburg, Germany
Abstract Processes can be classified in different categories. Light processes with amounts of humidity and powders, medium processes for reactive gases, H2, powder generation and harsh processes. In all these processes dry screw pumps – the gases have no contact to oil – are doing a very good job. Harsh processes are found mainly in the semiconductor industry. To manage these processes the backing pumps have to deal with toxic/corrosive gases, with solvents/ H2, humidity and powders. The powders are the result of the process or arising in the stage of the pump due to an after-reaction. Powders can be handled by the pump due to a an optimized gas flow in the pump. Condensables can occur in the stage of the pump when the pumps is not running at the right temperatures or partial pressures. These topics can be managed by the screw pump by using features of the pump like purge/dilution gas or by finding the right temperature of the pump which will be controlled by the cooling circuit. The screw pump for harsh processes is a dry pump with a leakage of 10-6 mbarl/sec. It is robust, can handle powders/fluids and special gases very well, has a low energy consumption and a high MTbPM.
13:55 Lecture 8
Performance Range and Limits of Turbomolecular pumps / Alexander Gerhard Performance Range and Limits of Turbomolecular pumps Alexander Gerhard Pfeiffer Vacuum GmbH, Berliner Straße 43, 35614 Asslar, Germany
Abstract The aim of this lecture is to discuss the basic design of turbo molecular pumps. The pumping effect of an arrangement consisting of rotor and stator blades, also the pumping speed as relation of transmission probability will be explained. We illustrate the design features and talk about the performance parameter and the limitation, which are based on the performance parameter. The influence of gas friction, heat radiation, magnetic fields, vibration and the back pressure identify the operation limits. Saftey aspects are important for the installation of the turbos. At the end of our presentation we will show our high reliability at harsh processes.
6/8
LECTURE 9 + 10 30. September 2015
14:20 Lecture 9
Recent developments in processes and materials of Optical Coatings / Michael Vergöhl Recent development in processes and materials of Optical Coatings Michael Vergöhl, Ralf Bandorf, Stefan Bruns, Thomas Neubert Fraunhofer-Institut für Schicht- und Oberflächentechnik (IST), Bienroder Weg 54 E, 38108 Braunschweig, Germany
Abstract Optical coatings play a key role in many industrial applications. Along with the growing demands on products, the development of deposition technology is an ongoing task. Different deposition techniques are important for the deposition of thin film coatings, and all of them have advantages and drawbacks. While sputtering is an excellent technique for the deposition of hard, even scratch resistant coatings or dens optical filters, PECVD techniques allow the deposition if elastic coatings at low temperatures. In the presentation, results of recent developments are presented, including the production of precision optical filters by the use of rotatable magnetrons, optical coatings on polymer substrates by PECVD and sputtering and the development of scratch resistant anti-reflective coatings on sapphire.
15:00 Lecture 10
Combined Ellipsometry and Reflectometry / Transmission for Insitu Multilayer Control / Uwe Richter Combined Ellipsometry and Reflectometry / Transmission for Insitu Multilayer Control Uwe Richter Sentech, Schwarzschildstraße 2, 12489 Berlin, Germany
Abstract The standard methods for insitu deposition control as reflectometry and transmission measurements are strong regarding thickness control. Sophisticated software solutions drive multilayer depositions. The limit of these methods is the low sensitivity against changes in the refractive index of materials as it is often the case on process or target changes. Ellipsometry is the method of choice to analyze the refractive index as well but introduces higher cost and is more complicated to apply to inline/insitu control. The application of reflection, transmission measurement and ellipsometry as inline and insitu control is shown with typical setups. Practical solutions are presented how to overcome such limitations at minimum cost. The discussed scenarios are batch coating, inline deposition and ALD deposition.
7/8
LECTURE 11 + 12 30. September 2015
15:25 Lecture 11
Using spectrally resolved R/T characteristics for inline process monitoring / Nancy Hecker-Denschlag Using spectrally resolved R/T characteristics for inline process monitoring Nancy Hecker-Denschlag m-u-t GmbH, Marlene-Dietrich-Straße 5, 89231 Neu-Ulm, Germany
Abstract m-u-t’s omtsYs Thin Film Analysis (TFA) device utilizes reflection and/or transmission over a large spectral range to determine a wide variety of sample parameters such as film thickness, absolute color, moisture content, sheet resistance, or n/k. These sample parameters can be determined for thin films coated on substrates ranging from PET, glass, metal sheets to semiconductors. Film thicknesses can be determined for semitransparent materials between 10 nm - 50 μm and for metals down to thicknesses of 2 nm. Note that the TFA measurement heads are designed for use in vacuum. The TFA is especially useful during factory bring-up, as well as real‐time process monitoring during e.g. in-situ production of solar, photovoltaic, or low-e films, high‐barrier foils, and ITO on PET. Inquire today about a demonstration of m-u-t’s measurement and sample analysis expertise!
15:50 Lecture 12
Process development and evaluation – Capabilities and recent results / Tobias Radny Process development and evaluation – Capabilities and recent results Tobias Radny robeko, An der Heide 3B, 67678 Mehlingen, Germany
Abstract Detailed knowledge of the performance of all components is essential for OEM manufactures. robeko’s R&D grants you a testing ground for the evaluation of state of the art PVD components. This lecture presents the capabilities of our laboratory thin film coating machines and analytics. A short overview of recent projects will be given and the results of two internal projects will be shown in-depth.
8/8
